Technology for rapid plasma-triggered reduction-exfoliation of graphene oxide based porous materials

Technology for rapid plasma-triggered reduction-exfoliation of graphene oxide based porous materialsOOO

plasma process

Slow motion video | 1 sec in video = 0.60 sec in real | Phenomenon recorded in time 0:25 - 0:27


EXP 1 - Slow motion video | EXP 2 - video speed 1x


  • sheet thickness: 20-100 µm


    • Typical electrical parameters:

  • Sheet resistance ~ 1-10 Ω .☐-1
  • Conductivity: 2000 S/m
sheet-m

LED


Porous 2D aerogel-like GO


Porous 3D aerogel-like GO cake


  • Porous GO layer deposited on PES nonwovens
  • Plasma reduction-exfoliation triggered by atmospheric plasma generated in pure N2 utilizing roll-to-roll DCSBD plasma reactor

  • Mimicking of R2R treatment at speed 2.5 cm.s-1

  • Proof-of-concept
  • Problems with surface uniformity of rGO layer – It is not a result of plasma treatment, but it is crucial to prepare a porous GO film on NWs of required quality (needs optimization)
textiles


This research was supported by project LM2018097 funded by the Ministry of Education, Youth and Sports of the Czech Republic and project MUNI/31/03202005/2020 funded by the Technology Agency of the Czech Republic.

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