Invitation to special lectures by D. Lundin

Department Of Physical Electronics invites you to special lectures by prof. Daniel Lundin, Professor at Linkoping University, Sweden.

Prof. Daniel Lundin Biography

2019 –                         Guest professor at Linkoping University (Sweden)
2015 – 2019    Senior Researcher CNRS (University Paris Sud, France)
2015 – 2016    Docent at Linkoping University (Sweden)
2011 – 2015    Researcher at KTH Royal Institute of Technology (Stockholm, Sweden)
2014 – 2014    Visiting Professor at Christian-Albrechts-Universität zu Kiel (CAU), (Germany)
2012 – 2013    Post-doc at University Paris Sud (France)
2010 – 2011    Post-doc at Linkoping University (Sweden)
2006 – 2010    Ph.D. at Linkoping University (Sweden)
2010 –                         Founder and Board Member of Ionautics company
2008 –                         Co-founder and Board Member of PlasmAdvance AB company

My work experience is mainly related to fundamental and applied research in the field of thin film synthesis using plasma-based techniques. My current research is focused on understanding and characterizing low-pressure plasma discharges, in particular the fascinating thin film plasma deposition technique High Power Impulse Magnetron Sputtering (HiPIMS).

A great interest in commercializing promising research output, which has resulted in several spin-off companies and collaborative projects with the industry.

Specialties
- plasma discharges and diagnostics
- plasma modeling: discharges, kinetics, and plasma chemistry
- thin film deposition by PVD and I-PVD
- HiPIMS, HPPMS

Lectures will take place on Tuesday 12/11/2019 in Dean's Office from 14:00 to 16:00 on theme
"A unified treatment of self-sputtering, process gas recycling, and runaway in magnetron discharges"

The combined processes of self-sputter recycling and process gas recycling in high power impulse magnetron sputtering (HiPIMS) discharges will be analyzed using the generalized recycling model (GRM).

"How to quantify the degree of ionization in High-Power Impulse Magnetron Sputtering"

Quantification and control of the fraction of ionization of the sputtered species are crucial in magnetron sputtering, and in particular in high-power impulse magnetron sputtering (HiPIMS). Three approaches how to define the ionization will be shown.

and Thursday 14/11/2019 in room F1 at 11:00

"Introduction to High-Power Impulse Magnetron Sputtering"

The seminar will be about HiPIMS fundamentals, which will include a comprehensive description of the HiPIMS process from fundamental physics to applications.

Invitation in pdf.